Compact plasma cleaner is an excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality.The rate of organic removal is about 10 nm/min Maximum at high NST power.
Compact plasma cleanermain features:
1. Cleaning and removing nanoscale organic contamination on wafer up to 2″ with various gas easily.
2. Excellent tool to pre-clean single crystal substrate before coating to the achieve a better film quality
Hinged type door for easy sample loading.
3. 3″ Diameter Quartz Chamber excellent for cleaning 2″ wafer with option Quartz Boat
4. Removable Quartz tube inside Quartz Chamber easy to clean and replacement.
Compact plasma cleaner specifications:
|NST Power||NST power (High voltage & high frequency current applied on the coil) is adjustable at three levels:
|Vacuum Gauge & Display||
|Vacuum Pump||One double stage Rotary Vane Vacuum Pump is included.|
|Input Power||AC 208 – 240V, 50/60Hz, single phase|
|Net Weight||40 Lbs|
|Warranty||One-year limited warranty with lifetime support ( no warranty for Pyrex glass chamber )|