Micrometer Film Applicator With Adjustable Width 0 – 150 Mm
- Model Number:NST-TM-150KT
- Dimension(L*W*H):0 – 150 mm adjustable width
- Compliance:CE Certified
- Warranty:1 year
- Place of Origin:Fujian, China (Mainland)
- MOQ:1
- Payment:L/C D/A D/P T/T Western Union
- Delivery Time:7 day
₹1.00
CompareMicrometer Film Applicator with Adjustable Width 0 – 150 mm
This unique wet film applicator features adjustment.for both of thickness and width. The operator sets the blade clearance by adjusting the micrometers, and sets up film width to be coated by adjusting blade width. This is an excellent tool to make quality film for material research laboratories to make ceramic tape casting, battery electrodes, and various coating at lower cost. Stainless steel knife blade with precision ground edge.
Specifications：
|
Features |
1. 0 – 150 mm adjustable width. |
|
Compliance |
CE Certified |
|
Warranty |
One years limited warranty with lifetime technical support |
Based on 0 reviews
Be the first to review “Micrometer Film Applicator With Adjustable Width 0 – 150 Mm”
Related products
-
Lab thin film Coating Systems, Magnetron Sputter coater
Dual-Target Magnetron Sputtering Coater
Dual-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated
SKU: 854613298-1-1-1-1-1-2-1-2-1-1-1-1-1-1-1-1-1-1-1-1-1 -
Lab thin film Coating Systems, Magnetron Sputter coater
NST Two zones CSS furnace with rotating wafer holder
Lab thin film Coating Systems, Magnetron Sputter coaterNST Two zones CSS furnace with rotating wafer holder
Two zones CSS furnace with rotating wafer holder is an advanced rapid thermal processing furnace with 11″ OD quartz chamber and 5″×5″ rotating sample holder. It is designed for CSS (Close Spaced Sublimation) film coating up to 5″ circular or square wafer samples at working temperature of 800°C Max.
SKU: n/a -
Lab thin film Coating Systems, Magnetron Sputter coater
NST-600-3HD three-target magnetron sputtering coater
Lab thin film Coating Systems, Magnetron Sputter coaterNST-600-3HD three-target magnetron sputtering coater
Three-target magnetron sputtering coater is equipped with three target guns, one supporting RF power supply for sputter coating of non-conductive targets, and two supporting DC power supplies for sputter coating of conductive materials
SKU: n/a -
Lab thin film Coating Systems, Magnetron Sputter coater
NST-in-line magnetron sputtering system
NST-in-line magnetron sputtering system is used to deposit metal film (Al, Ag, Ni, Cu, Ti, Pd, etc.) on the surface of crystal silicon, and can realize reactive sputtering. It can complete magnetron sputtering process under high and low vacuum, and also has the ability to produce crystalline silicon photovoltaic film in various sizes and larg.
SKU: n/a -
Lab thin film Coating Systems, Magnetron Sputter coater
Three targets magnetron sputtering coater NST-MSP300S-2DC1RF
Lab thin film Coating Systems, Magnetron Sputter coaterThree targets magnetron sputtering coater NST-MSP300S-2DC1RF
Three targets magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.
SKU: n/a
There are no reviews yet.