
Based on 0 reviews
Be the first to review “NST-12 Ion Sputter Coater” Cancel reply
Related products
-
Magnetron Sputtering coater, Thermal Evaporation Coater
NST Small high vacuum two-in-one film coater
0 out of 5(0)The plasma sputtering and evaporating two-in-one film coater is equipped with DC sputtering target and thermal evaporation assembly, which can be used not only for plasma sputtering, but also obtain carbon or other metal simple films by evaporation.
SKU: n/a -
Magnetron Sputtering coater
Dual-Target Magnetron Sputtering Coater
0 out of 5(0)Dual-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated
SKU: 854613298-1-1-1-1-1-2-1-2-1-1-1-1-1-1-1-1-1-1-1-1-1 -
Magnetron Sputtering coater
Dual-Target Magnetron Sputtering Coater NST-MSP300S-RFDC
Rated 5.00 out of 5(1)Dual-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated
SKU: 854613298-1-1-1-1-1-2-1-2-1-1-1-1-1-1-1-1-1-1-1-1-1-1-1-1-1 -
Magnetron Sputtering coater
NST Two in one film coater: plasma sputter and carbon evaporating
0 out of 5(0)NST Two in one film coater is a compact coating unit with double step rotary vane vacuum pump, which integrates plasma sputtering and evaporating into one small machine.It is specially designed for preparing SEM and EDAX sample for microstructure and micro-area composition analysis in material analysis at low cost. to coat various materials, including carbon.
SKU: n/a -
Magnetron Sputtering coater
NST-in-line magnetron sputtering system
0 out of 5(0)NST-in-line magnetron sputtering system is used to deposit metal film (Al, Ag, Ni, Cu, Ti, Pd, etc.) on the surface of crystal silicon, and can realize reactive sputtering. It can complete magnetron sputtering process under high and low vacuum, and also has the ability to produce crystalline silicon photovoltaic film in various sizes and larg.
SKU: n/a





There are no reviews yet.