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Magnetron Sputtering coater
NST-600-3HD three-target magnetron sputtering coater
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Magnetron Sputtering coater
NST-in-line magnetron sputtering system
NST-in-line magnetron sputtering system is used to deposit metal film (Al, Ag, Ni, Cu, Ti, Pd, etc.) on the surface of crystal silicon, and can realize reactive sputtering. It can complete magnetron sputtering process under high and low vacuum, and also has the ability to produce crystalline silicon photovoltaic film in various sizes and larg.
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Magnetron Sputtering coater
Three Target Heads Plasma Sputtering Coater NST-PSP180G-3TA
Three target heads plasma sputtering coater is a cost-effective plasma sputter coating equipment independently developed by our company. It has the advantages of compact structure, easy to use, high integration and strong sense of design
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Magnetron Sputtering coater
Single target NST magnetron sputtering coater NST-MSP300S-DC
Single target NST magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. The magnetron target head can be selected from 1 inch 2 inches 3 inches. Customers can choose the target according to the size of the substrate to be coated.
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Magnetron Sputtering coater, Thermal Evaporation Coater
NST Small high vacuum two-in-one film coater
The plasma sputtering and evaporating two-in-one film coater is equipped with DC sputtering target and thermal evaporation assembly, which can be used not only for plasma sputtering, but also obtain carbon or other metal simple films by evaporation.
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