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Magnetron Sputtering coater
NST-in-line magnetron sputtering system
NST-in-line magnetron sputtering system is used to deposit metal film (Al, Ag, Ni, Cu, Ti, Pd, etc.) on the surface of crystal silicon, and can realize reactive sputtering. It can complete magnetron sputtering process under high and low vacuum, and also has the ability to produce crystalline silicon photovoltaic film in various sizes and larg.
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Magnetron Sputtering coater
NST Single chamber magnetron sputtering system
Single chamber magnetron sputtering system is mainly composed of sputtering vacuum chamber, magnetron sputtering target, substrate water-cooled heating platform, working gas path, air extraction system, vacuum measurement, electronic control system and installation machine.
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Magnetron Sputtering coater
NST Programmable single chamber magnetron sputtering coater
Programmable single chamber magnetron sputtering coater is widely used in semiconductor, LED, photovoltaic and other industries. It is mainly used for the preparation of various metal, semiconductor and dielectric materials thin film, and can meet the needs of scientific research and small batch production.
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Magnetron Sputtering coater, Thermal Evaporation Coater
NST Small high vacuum two-in-one film coater
The plasma sputtering and evaporating two-in-one film coater is equipped with DC sputtering target and thermal evaporation assembly, which can be used not only for plasma sputtering, but also obtain carbon or other metal simple films by evaporation.
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Magnetron Sputtering coater
Dual-target NST magnetron sputtering coater (300W) NST-MSP300S-2RF
Dual-target NST magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.
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