₹1.00
CompareSmall Roll to Roll Battery Electrode Continuous Coating Machine
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The TMAX-TMJ-180C desktop continuous coating machine is a small roll to rolling coating machine for lab research, it is assembled by high high precision coating device, suitable for institutions, university and factory pilot scale battery research work.
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Model |
Roll to Roll Continuous Coating Machine TMAX-TMJ-180C |
|
Source voltage |
AC 220V/110V, 50HZ/60HZ |
|
Power |
400W |
|
Warranty |
One Year limited warranty with lifetime support |
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Suitable material thickness |
Aluminum foil : 0.01-0.03mm Copper foil : 0.006-0.020mm |
|
Max electrode width |
50-180mm |
|
Coating speed |
0-2m/min, adjustable |
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Max baking temperature |
100℃ ,PID control mode |
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Coating thickness |
0.01mm-2mm |
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Coating thickness accuracy |
0.01mm |
|
Dimension |
800* 350 * 580 mm |
|
Weight |
About 50kg |
Programmable single chamber magnetron sputtering coater is widely used in semiconductor, LED, photovoltaic and other industries. It is mainly used for the preparation of various metal, semiconductor and dielectric materials thin film, and can meet the needs of scientific research and small batch production.
Dual-target NST magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.
NST-in-line magnetron sputtering system is used to deposit metal film (Al, Ag, Ni, Cu, Ti, Pd, etc.) on the surface of crystal silicon, and can realize reactive sputtering. It can complete magnetron sputtering process under high and low vacuum, and also has the ability to produce crystalline silicon photovoltaic film in various sizes and larg.
The NST-300-2HD dual target magnetron sputtering coater is equipped with two target guns, one weak magnetic target is used for sputter coating of non-conductive materials and one strong magnetic target is used for sputter coating of ferromagnetic materials.
Single chamber magnetron sputtering system is mainly composed of sputtering vacuum chamber, magnetron sputtering target, substrate water-cooled heating platform, working gas path, air extraction system, vacuum measurement, electronic control system and installation machine.
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