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Magnetron Sputtering coater, Thermal Evaporation Coater
Small two-in-one coating machine NST-EVS180G-LV
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The small plasma sputtering and evaporation two-in-one coating machine is equipped with DC sputtering target and thermal evaporation assembly, which can not only be used for metal film plating by plasma sputtering, but also obtain carbon or other metal elemental films by evaporation.
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Magnetron Sputtering coater
NST-300-2HD dual target magnetron sputtering coater
The NST-300-2HD dual target magnetron sputtering coater is equipped with two target guns, one weak magnetic target is used for sputter coating of non-conductive materials and one strong magnetic target is used for sputter coating of ferromagnetic materials.
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Magnetron Sputtering coater
NST Combinatorial plasma sputtering coater with 3 magnetron sputtering sources
Magnetron Sputtering coaterNST Combinatorial plasma sputtering coater with 3 magnetron sputtering sources
Combinatorial plasma sputtering coater has three 2” magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and create various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery).
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Magnetron Sputtering coater
NST-600-3HD three-target magnetron sputtering coater
Three-target magnetron sputtering coater is equipped with three target guns, one supporting RF power supply for sputter coating of non-conductive targets, and two supporting DC power supplies for sputter coating of conductive materials
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Magnetron Sputtering coater
NST-300-1HD single target magnetron sputtering coater
Single target magnetron sputtering coater is equipped with a magnetron sputtering target with a water-cooled interlayer, a 140mm heatable rotating stage, and a DC power supply. The vacuum chamber adopts the top opening method, which makes it easier to change the target. It is an ideal device for making various metal films.
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