Based on 0 reviews
Be the first to review “NST-12 Ion Sputter Coater”
Related products
-
Magnetron Sputtering coater, Thermal Evaporation Coater
Small two-in-one coating machine NST-EVS180G-LV
-24%
Magnetron Sputtering coater, Thermal Evaporation CoaterSmall two-in-one coating machine NST-EVS180G-LV
The small plasma sputtering and evaporation two-in-one coating machine is equipped with DC sputtering target and thermal evaporation assembly, which can not only be used for metal film plating by plasma sputtering, but also obtain carbon or other metal elemental films by evaporation.
SKU: 854613298-1-1-1-1-1-2-1-2-1-1-1-1-1-1-1-1-1-1-1-1-1-1-1-1 -
Magnetron Sputtering coater
Small Plasma Sputtering Coater NST-PSP180G-1TA
Small plasma sputtering coater is a cost-effective plasma sputter coating equipment independently developed by our company. It has the advantages of compact structure, easy to use, high integration and strong sense of design.
SKU: n/a -
Magnetron Sputtering coater
Single-target NST magnetron sputtering coater NST-MSP300S-NST
Single-target NST magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization. The magnetron target head has 1 inch 2 inches and 3 inches to choose from. Customers can choose the target according to the size of the substrate to be plated.
SKU: n/a -
Magnetron Sputtering coater
NST-300-2HD dual target magnetron sputtering coater
The NST-300-2HD dual target magnetron sputtering coater is equipped with two target guns, one weak magnetic target is used for sputter coating of non-conductive materials and one strong magnetic target is used for sputter coating of ferromagnetic materials.
SKU: n/a -
Magnetron Sputtering coater
NST Combinatorial plasma sputtering coater with 3 magnetron sputtering sources
-23%
Magnetron Sputtering coaterNST Combinatorial plasma sputtering coater with 3 magnetron sputtering sources
Combinatorial plasma sputtering coater has three 2” magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and create various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery).
SKU: n/a
There are no reviews yet.