NST power supply
The PECVD system is composed of tube furnace, quartz vacuum chamber, vacuum system, gas supply system and rf power supply system.Mainly used in: metal film, ceramic film, composite film, graphene and other growth.It is easy to increase the function of plasma cleaning etching and etching.The PECVD system has advantages of high deposition rate, good uniformity, consistency and stability.
Power output range | 0-500W |
Maximum reflected power | 200W |
working frequency | RF:13.56MHZ±0.005% |
Pw stability | +/-0.1% |
harmonic component | ≤-50dbc |
Rf width | 0-600mm adjustable |
Matching mode | AUTO |
Cooling mode | air cold |
Noise | <50dB |
RF interface | 50Ω N-type |
Input power | 208-240V 50/60HZ |
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