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Lab thin film Coating Systems, Magnetron Sputter coater
NST Two zones CSS furnace with rotating wafer holder
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Two zones CSS furnace with rotating wafer holder is an advanced rapid thermal processing furnace with 11″ OD quartz chamber and 5″×5″ rotating sample holder. It is designed for CSS (Close Spaced Sublimation) film coating up to 5″ circular or square wafer samples at working temperature of 800°C Max.
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NST-5-inch close-range rotary evaporation coating furnace
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NST-5-inch close-range rotary evaporation coating furnace is specifically designed for thermal evaporation or CSS (Close Spaced Sublimation) coating experiments.Its coating area can reach 5″×5″, and the top sample stage can be rotated to improve coating uniformity.
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Dual-Target Magnetron Sputtering Coater
Dual-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated
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Lab thin film Coating Systems, Magnetron Sputter coater
NST Combinatorial plasma sputtering coater with 3 magnetron sputtering sources
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Combinatorial plasma sputtering coater has three 2” magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and create various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery).
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Single target NST magnetron sputtering coater NST-MSP300S-DC
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Single target NST magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. The magnetron target head can be selected from 1 inch 2 inches 3 inches. Customers can choose the target according to the size of the substrate to be coated.
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