NST-in-line magnetron sputtering system is used to deposit metal film (Al, Ag, Ni, Cu, Ti, Pd, etc.) on the surface of crystal silicon, and can realize reactive sputtering. It can complete magnetron sputtering process under high and low vacuum, and also has the ability to produce crystalline silicon photovoltaic film in various sizes and larg.
NST Customized 5 heads RF plasma magnetron sputtering coater is capable of a five-element combinatorial coating of up to 16 samples with varying compositions, making it especially good for searching high-performance solid state electrolyte materials, magnetic alloys, and multiferroic materials.
Three-target magnetron sputtering coater is equipped with three target guns, one supporting RF power supply for sputter coating of non-conductive targets, and two supporting DC power supplies for sputter coating of conductive materials
Dual-target NST magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.
Single target magnetron sputtering coater is equipped with a magnetron sputtering target with a water-cooled interlayer, a 140mm heatable rotating stage, and a DC power supply. The vacuum chamber adopts the top opening method, which makes it easier to change the target. It is an ideal device for making various metal films.
Three targets NST magnetron sputtering coater NST-MSP300S-3DC 
NST-300-2HD dual target magnetron sputtering coater 
NST Programmable single chamber magnetron sputtering coater 
There are no reviews yet.