Magnetron Sputter coater

Compact powder NST coating system consists of 2″ water cold magnetron sputtering head and vibration stage. The particles will jump on the vibration stage during coating and form a core-shell structure. The coater will be useful for preparing special powder for 3D printing and solid state electrolyte powders.

High power DC magnetron sputtering coater is a high power desktop magnetron plasma sputtering coater with a water cooling 2″ target head, water chiller and rotatable sample holder. The coating unit is designed for coating all metallic films up to 4″ diameter wafer including Zn, Al, Ti and carbon light film at an affordable cost. One Al target is included for immediate use.

Combinatorial plasma sputtering coater has three 2” magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and create various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery).

NST Electron beam evaporation coating system is mainly composed of evaporation vacuum chamber, e-type electron gun, thermal evaporation electrode, rotary substrate heating platform, working air path, exhaust system, vacuum measurement, electronic control system and installation machine platform.

NST Four sources thermal evaporating system is a compact thermal evaporating system with total 4 evaporating source crucibles and precision and programmable temperature control. Four evaporating crucibles could be used to deposit multiple different materials to grow multilayers films one by one in the same chamber.

RF plasma magnetron sputtering coater is a compact 2″ single head RF Plasma magnetron sputtering system coating non-metallic, mainly oxide thin film. It integrates all components into one-floor stand cabinet, including RF power source, quartz vacuum chamber, vacuum pump, recirculation water chiller and film thickness.

Precision temperature controlled hi-vacuum thermal evaporating coater is suitable for coating most of metallic and organic materials film up to 2″ size from 200 ºC to 1500 ºC (or 200 ºC – 1700 ºC with an optional B-type thermocouple). A rotatable sample holder is built in to allow uniform film coating.

NST Two in one film coater is a compact coating unit with double step rotary vane vacuum pump, which integrates plasma sputtering and evaporating into one small machine.It is specially designed for preparing SEM and EDAX sample for microstructure and micro-area composition analysis in material analysis at low cost. to coat various materials, including carbon.

Two zones CSS furnace with rotating wafer holder is an advanced rapid thermal processing furnace with 11″ OD quartz chamber and 5″×5″ rotating sample holder. It is designed for CSS (Close Spaced Sublimation) film coating up to 5″ circular or square wafer samples at working temperature of 800°C Max.

NST 3 heads compact RF plasma magnetron sputtering coater is designed for non-metallic thin film coating, mainly for multilayer oxide thin films.DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF/two DC, and two RF/one DC sputtering head configurations.

NST 3 rotary target plasma sputtering coater is a compact three rotary target plasma sputtering coater with a touch screen digital controller, and a substrate heater capable of heating up to 500 °C. It can coat 1-3 types of metallic materials to sample with the diameter up to 50 mm.Three sputtering targets: gold, silver, copper are included for immediate use.