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Desktop single target DC magnetron sputtering coater with stainless steel Chamber

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This equipment is a single-target magnetron sputtering coater, it can be used in the preparation of metal film, and also used in electronic fields, optical fields, special field of ceramic preparation ,it surely can be used in SEM sample preparation in laboratory.

850,000.001,750,000.00

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This equipment is a single-target magnetron sputtering coater, it can be used in the preparation of metal film, and also used in electronic fields, optical fields, special field of ceramic preparation ,it surely can be used in SEM sample preparation in laboratory。

This set is single-target magnetron sputtering coater equipped with high vacuum stainless steel cavity, the cavity is set with a quartz observation window baffle, which is easy to observe and record the experiment; The cavity design with excellent vacuum performance and small shape makes it very suitable for laboratory use. At the same time, the equipment is equipped with a rotating heating sample table, which can effectively improve the film uniformity and film quality. The machine adopts modular design, simple operation logic, and intuitive operation interface, easy to get started.

magnetron sputtering coater Technical Parameters:

product name Desktop stainless steel cavity   single target DC magnetron sputtering coater apparatus
Product number NST-I-DC-SS
sample stage

 

Dimensions φ100mm
Heating temperature ≦500℃
Adjustable speed ≦20rpm
Magnetic target gun Equipped with a two-inch magnetic control target, target size: diameter   50.8mm, thickness ≦3mm
vacuum chamber

 

Cavity size φ194mm X 263mm
observation window omnidirectionally transparent
Cavity material 304 stainless steel
Opening method Removable top cover
Vacuum system

 

Backing pump Low noise bipolar rotary vane pump
Molecular pump Low noise and high pumping speed turbomolecular pump
Vacuum measurement Composite vacuum gauge, range: 1*10-4Pa
Air extraction interface KF16
Air extraction interface KF40
Exhaust interface KF16
System vacuum 1.0×10-4Pa
Power supply AC 220V 50/60Hz
Pumping rate The pumping speed of the molecular pump is 60L/s, and the pumping speed   of the backing pump is 1.1L/s.
Power configuration

 

Number of power supplies A set of DC power supply
Output Power DC power supply 500W
Other parameters Supply voltage AC220V,50Hz
Total power 2kW
weight 80kg
Overall size 550mm X 450mm X750mm
SKU: N/A Category:
Weight N/A
Dimensions N/A
Vacuum Pumping System

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