NST-12 Ion Sputter Coater

NST-in-line magnetron sputtering system is used to deposit metal film (Al, Ag, Ni, Cu, Ti, Pd, etc.) on the surface of crystal silicon, and can realize reactive sputtering. It can complete magnetron sputtering process under high and low vacuum, and also has the ability to produce crystalline silicon photovoltaic film in various sizes and larg.

High vacuum magnetron sputtering coater is mainly composed of sputtering vacuum chamber, magnetron sputtering target, substrate water-cooled heating revolution table, working gas path, pumping system, installation machine, vacuum measurement and electronic control system.

NST-5-inch close-range rotary evaporation coating furnace is specifically designed for thermal evaporation or CSS (Close Spaced Sublimation) coating experiments.Its coating area can reach 5″×5″, and the top sample stage can be rotated to improve coating uniformity.