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NST Electron beam evaporation coating system


NST Electron beam evaporation coating system is mainly composed of evaporation vacuum chamber, e-type electron gun, thermal evaporation electrode, rotary substrate heating platform, working air path, exhaust system, vacuum measurement, electronic control system and installation machine platform.

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TECHNICAL PARAMETER

NST Electron beam evaporation coating system is used for preparing conductive film, semiconductor film, ferroelectric film, optical film, etc. It is widely used in colleges and universities, scientific research institutions and small batch production.

Electron beam evaporation coating system specifications:

Structure U-box front opening vacuum chamber, rear-mounted pumping system
Vacuum chamber 500×500×600mm2
Vacuum system configuration Compound molecular pump, mechanical pump, gate valve
Ultimate pressure

 

≤6. 67×10-5Pa (after baking and degassing)
Vacuum recovery system It can reach 6.67×10-4pa in 45 minutes (after the system is exposed to the   atmosphere for a short time and is filled with dry nitrogen)
Electron beam evaporation source E type electron gun Anode voltage: 6kv、8kv;
Quantity (set) 1
Crucible Water-cooled crucible, four point design, each capacity of 11ml
Power 0~6 KW adjustable
Resistance evaporation source (optional) Voltage 5, 10V
Power Current 300A,the maximum output 3kw
Quantity One set, Switchable
Water cooling electrode Three roots, make up two evaporation boats
Type and size of workpiece frame Substrate size:  compatible with 4″substrate

Max substrate   heating temperature 800℃±1℃

Substrate rotates continuously, rotation speed:5-60 rpm

The distance between the substrate and the evaporation source is adjustable from 300 to   350mm

Manually controlled sample baffle   assembly: 1 set

Gas circuit   system 1-circuit 200SCCM mass flow controller
Quartz crystal oscillation film thickness controller Thickness monitoring range: 0~99u9999A;
Space occupied Main Set 900×800mm2
Electrical   Cabinet 800×800mm2 (two)

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