TECHNICAL PARAMETER
NST Electron beam evaporation coating system is used for preparing conductive film, semiconductor film, ferroelectric film, optical film, etc. It is widely used in colleges and universities, scientific research institutions and small batch production.
Electron beam evaporation coating system specifications:
Structure | U-box front opening vacuum chamber, rear-mounted pumping system | |
Vacuum chamber | 500Ć500Ć600mm2 | |
Vacuum system configuration | Compound molecular pump, mechanical pump, gate valve | |
Ultimate pressure
|
ā¤6. 67Ć10-5Pa (after baking and degassing) | |
Vacuum recovery system | It can reach 6.67Ć10-4pa in 45 minutes (after the system is exposed to the Ā atmosphere for a short time and is filled with dry nitrogen) | |
Electron beam evaporation source | E type electron gun | Anode voltage: 6kvć8kv; |
Quantity (set) | 1 | |
Crucible | Water-cooled crucible, four point design, each capacity of 11ml | |
Power | 0~6 KW adjustable | |
Resistance evaporation source (optional) | Voltage | 5, 10V |
Power | Current 300Aļ¼the maximum output 3kw | |
Quantity | One set, Switchable | |
Water cooling electrode | Three roots, make up two evaporation boats | |
Type and size of workpiece frame | Substrate size:Ā compatible with 4ā³substrate
Max substrate Ā heating temperature 800ā±1ā Substrate rotates continuously, rotation speed:5-60 rpm The distance between the substrate and the evaporation source is adjustable from 300 to Ā 350mm Manually controlled sample baffle Ā assembly: 1 set |
|
Gas circuit Ā system | 1-circuit 200SCCM mass flow controller | |
Quartz crystal oscillationĀ film thickness controller | Thickness monitoring range: 0~99u9999A; | |
Space occupied | Main Set | 900Ć800mm2 |
Electrical Ā Cabinet | 800Ć800mm2 (two) |
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