High vacuum magnetron sputtering coater is mainly composed of sputtering vacuum chamber, magnetron sputtering target, substrate water-cooled heating revolution table, working gas path, pumping system, installation machine, vacuum measurement and electronic control system.
Dual-target NST magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.
Dual-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated
NST-dual-head high vacuum magnetron plasma sputtering coater is a compact magnetron sputtering system with dual 2 target sources, e.g., one DC source for coating metallic film, and the other RF source for coating non-metallic material.
Combinatorial plasma sputtering coater has three 2” magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and create various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery).
Vacuum Rapid Heated Pressing Furnace up to NST 1600℃ 
Dual-Target Magnetron Sputtering Coater 
Single-target NST magnetron sputtering coater NST-MSP300S-NST 
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