Recommended Products
Automatic Lab Vacuum Film Coating Machine
Automatic Lab Vacuum Film Coating Machine
NST Two Stage Water Ring Vacuum Pump
NST has developed its series of Two Stage Liquid Ring Vacuum Pump based on positive displacement liquid ring principle which has a superior performance by getting higher vacuum and at comparatively low water consumption. it develops an ultimate vacuum of 720 mm hg at the sealing water temperature of 30°c with the capacity range of 30 to 1000 m3/hr., the same can be increased put 735 mm hg. When supplied with 15℃ to 18℃. this design is latest considering the saving of energy.
NST-10L 13.56MHz Plasma Cleaner
Featrues
1. Environmental technologies: plasma process is the role of gas – solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
2. Wide adaptability: regardless of processing substrate type, such as metals, semiconductors.
Dual-Target Magnetron Sputtering Coater NST-MSP300S-RFDC
Dual-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated
Small two-in-one coating machine NST-EVS180G-LV
Small two-in-one coating machine NST-EVS180G-LV
The small plasma sputtering and evaporation two-in-one coating machine is equipped with DC sputtering target and thermal evaporation assembly, which can not only be used for metal film plating by plasma sputtering, but also obtain carbon or other metal elemental films by evaporation.
Three Target Heads Plasma Sputtering Coater NST-PSP180G-3TA
Three Target Heads Plasma Sputtering Coater NST-PSP180G-3TA
Three target heads plasma sputtering coater is a cost-effective plasma sputter coating equipment independently developed by our company. It has the advantages of compact structure, easy to use, high integration and strong sense of design
Small Plasma Sputtering Coater NST-PSP180G-1TA
Small plasma sputtering coater is a cost-effective plasma sputter coating equipment independently developed by our company. It has the advantages of compact structure, easy to use, high integration and strong sense of design.
Dual-Target Magnetron Sputtering Coater
Dual-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated
1000W 5L Plasma Cleaner NST-P5L-1000W
5L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned
100W/150W 10L Plasma Cleaner NST-P10L-100W
10L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned
300W / 500W 10L Oxygen Plasma Cleaner NST-P10L-300W/500W
10L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned
1000W 10L Plasma Pleaner NST-P10L-1000W
10L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned.
300W/500W 5L Oxygen Plasma Cleaner NST-P5L-300W
5L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned
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Muffle Furnaces (400 - 1900 C)
Vacuum arc Melting Furnace NST-AM180-V7X
This product is a small vacuum arc melting furnace with tungsten electrodes and water-cooled copper crucible. The equipment melting temperature can exceed 3000℃, and the temperature is reduced rapidly. The equipment adopts stainless steel water-cooled chamber and is equipped with a quartz observation window
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Vacuum Chamber
Vacuum Chambers
NST manufactures welded aluminum/ stainless steel vacuum chambers for the high vacuum applications according to customer’s demands.
The shapes of customized vacuum chambers we supply are can be cylindrical, box, D-shape, spherical, polygon and bell jar. The surface treatment of the vacuum chambers are sandblast, polished, and electro polished. Every chamber weld and seal is helium leak tested before leaving our facility.
Aluminum vacuum chambers are mainly used in plasma cleaning, plasma etching cleaning, semiconductor and other industries. Use a vacuum chamber made of aluminum alloys provides several advantages over stainless steel. Some of the benefits include lower material cost, lighter weight, faster machining, high thermal conductivity, low nuclear activation, low magnetic permeability, and low carbon.
Customized stainless steel and aluminum vacuum chambers are exported in many European countries, United States, Israel, Russia, India and Singapore in worldwide. Contact us and send the drawing for more information on stainless steel vacuum and aluminum chambers.
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PVD Machine's Raw Coating Material, PVD Vacuum Coating Machines
vacuum metalizng machine Magnetic valve
PVD Machine's Raw Coating Material, PVD Vacuum Coating Machinesvacuum metalizng machine Magnetic valve
Holding pump Magnetic valve :size:115*115 mm suitable for 2X-30 rotary vane pump
Backing pump Magnetic valve: size:160mm * 140mm*140mm suitabel for 2X-70 rotary vane pump
Model: DN16;DN25;DN32.DN40;DN50;DN65;DN80;DN100
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Lab Sample Preparation Equipment, Planetary Ball Mills
Vertical Planetary Ball Mill for Glove Box Use
Lab Sample Preparation Equipment, Planetary Ball MillsVertical Planetary Ball Mill for Glove Box Use
Applications:XQM-0.2S is a kind of supper mini model of vertical planetary ball mill which is specially designed to be used for grinding materials under vacuum or inert gas atmosphere conditions inside the glove box.
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Lab Sample Preparation Equipment, Planetary Ball Mills
Vibratory Ball Mill
Applications:It is widely used in the fields of electronics, ceramics, chemicals, powder metal, tungsten, Calcium carbide, rubber compounds, magnetic materials and high-frequency porcelain material and pharmaceutical of radio industries.
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