NST-12 Ion Sputter Coater

NST-in-line magnetron sputtering system is used to deposit metal film (Al, Ag, Ni, Cu, Ti, Pd, etc.) on the surface of crystal silicon, and can realize reactive sputtering. It can complete magnetron sputtering process under high and low vacuum, and also has the ability to produce crystalline silicon photovoltaic film in various sizes and larg.

Single-target NST magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization. The magnetron target head has 1 inch 2 inches and 3 inches to choose from. Customers can choose the target according to the size of the substrate to be plated.