Three targets NST magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.
Two zones CSS furnace with rotating wafer holder is an advanced rapid thermal processing furnace with 11″ OD quartz chamber and 5″×5″ rotating sample holder. It is designed for CSS (Close Spaced Sublimation) film coating up to 5″ circular or square wafer samples at working temperature of 800°C Max.
NST-Ultra-High vacuum thermal evaporation coater is designed for coating oxygen sensitive metallic materials, such as Ti, Al, and Ir etc. It also can be used for coating all kinds of materials. It has four evaporation heater sources and coat two type of materials at the same time at high vacuum up to 10-6 torr.
Single-target NST magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization. The magnetron target head has 1 inch 2 inches and 3 inches to choose from. Customers can choose the target according to the size of the substrate to be plated.
NST Organic and inorganic evaporation coater is used in the growth of thin-film solar cell, research of ELOEL molecular organic electroluminescent devices thin films. It can be widely used in small amount production and on the scientific research on film materials by universities and research institutes.
NST-300-2HD dual target magnetron sputtering coater 
NST Combinatorial plasma sputtering coater with 3 magnetron sputtering sources 
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