Programmable single chamber magnetron sputtering coater is widely used in semiconductor, LED, photovoltaic and other industries. It is mainly used for the preparation of various metal, semiconductor and dielectric materials thin film, and can meet the needs of scientific research and small batch production.
Combinatorial plasma sputtering coater has three 2” magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and create various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery).
NST-dual-head high vacuum magnetron plasma sputtering coater is a compact magnetron sputtering system with dual 2 target sources, e.g., one DC source for coating metallic film, and the other RF source for coating non-metallic material.
The NST-300-2HD dual target magnetron sputtering coater is equipped with two target guns, one weak magnetic target is used for sputter coating of non-conductive materials and one strong magnetic target is used for sputter coating of ferromagnetic materials.
NST-5-inch close-range rotary evaporation coating furnace is specifically designed for thermal evaporation or CSS (Close Spaced Sublimation) coating experiments.Its coating area can reach 5″×5″, and the top sample stage can be rotated to improve coating uniformity.
Three targets magnetron sputtering coater NST-MSP300S-2DC1RF 
NST Four sources thermal evaporating system 
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