Two zones CSS furnace with rotating wafer holder is an advanced rapid thermal processing furnace with 11″ OD quartz chamber and 5″×5″ rotating sample holder. It is designed for CSS (Close Spaced Sublimation) film coating up to 5″ circular or square wafer samples at working temperature of 800°C Max.
NST-Ultra-High vacuum thermal evaporation coater is designed for coating oxygen sensitive metallic materials, such as Ti, Al, and Ir etc. It also can be used for coating all kinds of materials. It has four evaporation heater sources and coat two type of materials at the same time at high vacuum up to 10-6 torr.
NST-5-inch close-range rotary evaporation coating furnace is specifically designed for thermal evaporation or CSS (Close Spaced Sublimation) coating experiments.Its coating area can reach 5″×5″, and the top sample stage can be rotated to improve coating uniformity.
Three targets magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.
NST Customized 5 heads RF plasma magnetron sputtering coater is capable of a five-element combinatorial coating of up to 16 samples with varying compositions, making it especially good for searching high-performance solid state electrolyte materials, magnetic alloys, and multiferroic materials.
Three targets NST magnetron sputtering coater NST-MSP300S-3DC 
NST-300-2HD dual target magnetron sputtering coater 
NST Programmable single chamber magnetron sputtering coater 
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