TECHNICAL PARAMETER
NST-600-3HD three-target magnetron sputtering coater is a newly developed coating equipment, which can be used to prepare monolayer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic film, dielectric film, optical Film, oxide film, hard film, polytetrafluoroethylene film, and the like. Compared with similar equipment, it is not only widely used, but also has the advantages of small size and easy operation. It is an ideal equipment for laboratory preparation of material films, especially suitable for laboratory research on solid electrolytes and OLEDs.
NST-600-3HD three-target magnetron sputtering coater specifications:
Name | NST-300-3HD Â three-target magnetron sputtering coater | ||
Model | NST-300-3HD | ||
Installation  conditions | This  equipment is required to be used at the altitude of 1000m or less, the  temperature of 25℃±  15℃, and the  humidity of 55% Rh ± 10% Rh.
1.  Water: The equipment is equipped with a self-circulating chiller (filling  pure water or deionized water) 2.  Electricity: AC220V 50Hz, must have a good ground connection. 3.  Gas: The equipment chamber needs to be filled with argon gas (purity of  99.99% or more). Self-provided argon gas cylinder (with Ø6mm double ferrule  joint) and pressure reducing valve 4.  Workbench: size 650mm × 600mm × 700mm, bearing more than 200kg 5. Ventilation  device: need |
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Main features | 1.  Configure three target guns, it can be used for RF coating power supply for  sputter coating of non-conductive targets, or DC power supply for sputter  coating of conductive materials (target guns can be exchanged according to  customer needs).
2.  It can prepare a variety of films, and has a wide range of applications. 3.  It is small in size and easy to operate. 4.  the modular design of the whole machine, vacuum chamber, vacuum pump set,  control power supply split type design, it can be adjusted according to the  actual needs of users. 5.  you can choose the power supply according to your actual needs, it can  control multiple target guns with one power supply, or control one target gun  with multiple power sources |
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Technical  parameters | 1.  the power supply voltage: 220V 50Hz
2.  total power: 2.5W (excluding vacuum pump) 3.  Working vacuum degree: 10-4Pa 4.  working temperature: RT-500℃,  accuracy ± 1℃(you can  increase the temperature according to actual needs) 5.  the number of target guns: 3 6.  target gun cooling method: water cooling 7.  Target size: Ø2’’, thickness 0.1-5mm (different thickness depending on target  material) 8.  DC sputtering power: 500W (optional) 9.  RF sputtering power: 300W / 500W (optional) 10.  loading sample table: Ø140mm 11.  the sample table speed: adjustable within 1rpm-20rpm 12.  Protective gas: inert gases such as Ar and N2 13.  Intake gas path: mass flow meter controls 2 channels of intake air, 1 flow is  100 SCCM, 1 flow is 200 SCCM |
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specifications | Main  unit size: 500mm×560mm×660mm, the whole machine size: 1300mm×660mm×1200mm;  weight: 160kg | ||
Standard  accessories | 1 | DC power control  system | 1 |
2 | RF power control  system | 1 | |
3 | Film  thickness monitor system | 1 | |
4 | Molecular  pump | 1 | |
5 | Chiller | 1 | |
6 | Cooling  water pipe (Ø6mm) | 4 | |
Standard  accessories | Various targets  such as gold, indium, silver, and platinum |
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