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NST has developed its series of Two Stage Liquid Ring Vacuum Pump based on positive displacement liquid ring principle which has a superior performance by getting higher vacuum and at comparatively low water consumption. it develops an ultimate vacuum of 720 mm hg at the sealing water temperature of 30°c with the capacity range of 30 to 1000 m³/hr., the same can be increased put 735 mm hg. When supplied with 15℃ to 18℃. this design is latest considering the saving of energy.

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Oxygen Plasma Cleaners

NST-10L 13.56MHz Plasma Cleaner

Oxygen Plasma Cleaners

NST-10L 13.56MHz Plasma Cleaner

0 out of 5

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Featrues

1. Environmental technologies: plasma process is the role of gas – solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.

2. Wide adaptability: regardless of processing substrate type, such as metals, semiconductors.

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Lab thin film Coating Systems

Dual-Target Magnetron Sputtering Coater NST-MSP300S-RFDC

Lab thin film Coating Systems

Dual-Target Magnetron Sputtering Coater NST-MSP300S-RFDC

Rated 5.00 out of 5

(1)

Dual-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated

SKU: 854613298-1-1-1-1-1-2-1-2-1-1-1-1-1-1-1-1-1-1-1-1-1-1-1-1-1

Lab thin film Coating Systems, Plasma sputtering coater

Small two-in-one coating machine NST-EVS180G-LV

Lab thin film Coating Systems, Plasma sputtering coater

Small two-in-one coating machine NST-EVS180G-LV

0 out of 5

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The small plasma sputtering and evaporation two-in-one coating machine is equipped with DC sputtering target and thermal evaporation assembly, which can not only be used for metal film plating by plasma sputtering, but also obtain carbon or other metal elemental films by evaporation.

SKU: 854613298-1-1-1-1-1-2-1-2-1-1-1-1-1-1-1-1-1-1-1-1-1-1-1-1

Lab thin film Coating Systems, Plasma sputtering coater

Three Target Heads Plasma Sputtering Coater NST-PSP180G-3TA

Lab thin film Coating Systems, Plasma sputtering coater

Three Target Heads Plasma Sputtering Coater NST-PSP180G-3TA

0 out of 5

(0)

Three target heads plasma sputtering coater is a cost-effective plasma sputter coating equipment independently developed by our company. It has the advantages of compact structure, easy to use, high integration and strong sense of design

SKU: 854613298-1-1-1-1-1-2-1-2-1-1-1-1-1-1-1-1-1-1-1-1-1-1-1

Plasma sputtering coater

Small Plasma Sputtering Coater NST-PSP180G-1TA

Plasma sputtering coater

Small Plasma Sputtering Coater NST-PSP180G-1TA

0 out of 5

(0)

Small plasma sputtering coater is a cost-effective plasma sputter coating equipment independently developed by our company. It has the advantages of compact structure, easy to use, high integration and strong sense of design.

SKU: n/a

Lab thin film Coating Systems, Magnetron Sputter coater

Dual-Target Magnetron Sputtering Coater

Lab thin film Coating Systems, Magnetron Sputter coater

Dual-Target Magnetron Sputtering Coater

0 out of 5

(0)

SKU: 854613298-1-1-1-1-1-2-1-2-1-1-1-1-1-1-1-1-1-1-1-1-1

Oxygen Plasma Cleaners

1000W 5L Plasma Cleaner NST-P5L-1000W

Oxygen Plasma Cleaners

1000W 5L Plasma Cleaner NST-P5L-1000W

0 out of 5

(0)

5L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned

SKU: 854613298-1-1-1-1-1-2-1-2-1-1-1-1-1-1-1-1-1-1-1-1

Oxygen Plasma Cleaners

100W/150W 10L Plasma Cleaner NST-P10L-100W

Oxygen Plasma Cleaners

100W/150W 10L Plasma Cleaner NST-P10L-100W

0 out of 5

(0)

10L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned

SKU: n/a