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NST-1400°C 40-Segment Muffle Furnaces W/ PC Interface
1 × ₹350,000.00 -
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NST-10L 13.56MHz Plasma Cleaner
1 × ₹840,000.00
Subtotal: ₹1,190,000.00
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Model Number:NST-VFC-150
Input Power:650W
Dimension(L*W*H):500*350*320mm
Net Weight:42KG
Compliance:CE Certified
Warranty:1 year
Payment:L/C D/A D/P T/T Western Union
Delivery Time:30 day
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Vacuum Pumps & Vacuum Pumping Systems
NST Two Stage Water Ring Vacuum Pump
NST has developed its series of Two Stage Liquid Ring Vacuum Pump based on positive displacement liquid ring principle which has a superior performance by getting higher vacuum and at comparatively low water consumption. it develops an ultimate vacuum of 720 mm hg at the sealing water temperature of 30°c with the capacity range of 30 to 1000 m3/hr., the same can be increased put 735 mm hg. When supplied with 15℃ to 18℃. this design is latest considering the saving of energy.
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Oxygen Plasma Cleaners
NST-10L 13.56MHz Plasma Cleaner
Featrues
1. Environmental technologies: plasma process is the role of gas – solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
2. Wide adaptability: regardless of processing substrate type, such as metals, semiconductors.
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Lab thin film Coating Systems
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Lab thin film Coating Systems, Plasma sputtering coater
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SKU: 854613298-1-1-1-1-1-2-1-2-1-1-1-1-1-1-1-1-1-1-1-1-1-1-1-1
Lab thin film Coating Systems, Plasma sputtering coater
Three Target Heads Plasma Sputtering Coater NST-PSP180G-3TA
Lab thin film Coating Systems, Plasma sputtering coater
Three Target Heads Plasma Sputtering Coater NST-PSP180G-3TA
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Plasma sputtering coater
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Lab thin film Coating Systems, Magnetron Sputter coater
Dual-Target Magnetron Sputtering Coater
Dual-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated
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Oxygen Plasma Cleaners
1000W 5L Plasma Cleaner NST-P5L-1000W
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Oxygen Plasma Cleaners
100W/150W 10L Plasma Cleaner NST-P10L-100W
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300W / 500W 10L Oxygen Plasma Cleaner NST-P10L-300W/500W
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Oxygen Plasma Cleaners
1000W 10L Plasma Pleaner NST-P10L-1000W
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300W/500W 5L Oxygen Plasma Cleaner NST-P5L-300W
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Shop
Showing 361–384 of 519 results
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Lab thin film Coating Systems, Magnetron Sputter coater
NST-3 heads compact RF plasma magnetron sputtering coater
Lab thin film Coating Systems, Magnetron Sputter coaterNST-3 heads compact RF plasma magnetron sputtering coater
NST 3 heads compact RF plasma magnetron sputtering coater is designed for non-metallic thin film coating, mainly for multilayer oxide thin films.DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF/two DC, and two RF/one DC sputtering head configurations.
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Lab thin film Coating Systems, Magnetron Sputter coater
NST-3 Rotary Target Plasma Sputtering Coater with Substrate Heater
Lab thin film Coating Systems, Magnetron Sputter coaterNST-3 Rotary Target Plasma Sputtering Coater with Substrate Heater
NST 3 rotary target plasma sputtering coater is a compact three rotary target plasma sputtering coater with a touch screen digital controller, and a substrate heater capable of heating up to 500 °C. It can coat 1-3 types of metallic materials to sample with the diameter up to 50 mm.Three sputtering targets: gold, silver, copper are included for immediate use.
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Lab thin film Coating Systems, Magnetron Sputter coater
NST-3″ two zones CSS furnace for rapid thermal processing
Lab thin film Coating Systems, Magnetron Sputter coaterNST-3″ two zones CSS furnace for rapid thermal processing
NST-3″ two zones CSS furnace is a two heating zone rapid thermal processing furnace with 11″ O.D quartz tube. It is designed for PVD or CSS (Close Spaced Sublimation) film coating up to 3″ diameter or 2″×2″ square.
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Lab thin film Coating Systems, Magnetron Sputter coater
NST-300-1HD single target magnetron sputtering coater
Lab thin film Coating Systems, Magnetron Sputter coaterNST-300-1HD single target magnetron sputtering coater
Single target magnetron sputtering coater is equipped with a magnetron sputtering target with a water-cooled interlayer, a 140mm heatable rotating stage, and a DC power supply. The vacuum chamber adopts the top opening method, which makes it easier to change the target. It is an ideal device for making various metal films.
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Lab thin film Coating Systems, Magnetron Sputter coater
NST-300-2HD dual target magnetron sputtering coater
Lab thin film Coating Systems, Magnetron Sputter coaterNST-300-2HD dual target magnetron sputtering coater
The NST-300-2HD dual target magnetron sputtering coater is equipped with two target guns, one weak magnetic target is used for sputter coating of non-conductive materials and one strong magnetic target is used for sputter coating of ferromagnetic materials.
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Lab Hydraulic Press, Lab Sample Preparation Equipment
NST-40T Manual Powder Hydraulic Press for laboratory NST-PC-40
Lab Hydraulic Press, Lab Sample Preparation EquipmentNST-40T Manual Powder Hydraulic Press for laboratory NST-PC-40
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Oxygen Plasma Cleaners
NST-45mm rotary spray gun plasma cleaner
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Oxygen Plasma Cleaners
NST-4mm direct spray gun plasma cleaner (Ultrasonic Cleaner)
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Lab thin film Coating Systems, Magnetron Sputter coater
NST-5-inch close-range rotary evaporation coating furnace
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Vacuum Oven
NST-50L 200C Vacuum Dry Oven (16.3 X 13.5 X 14.5″ ) With Digital Temperature Controller
- Model Number: NST-GN-6050
- Dimension(L*W*H): 415 mm x 345 mm x 370 mm
- Max. Loading Capacity: 50L
- Net Weight: 200 Lb
- Compliance: ISO, CE Certified
- Warranty: Two years limited warranty with lifetime technical support
- Payment: L/C D/A D/P T/T Western Union
- Delivery Time: 30 days
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Oxygen Plasma Cleaners
NST-5L Plasma Cleaner
Featrues
1. Environmental technologies: plasma process is the role of gas – solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
2. Wide adaptability: regardless of processing substrate type, such as metals, semiconductors, oxides, and most.
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Lab thin film Coating Systems, Magnetron Sputter coater
NST-600-3HD three-target magnetron sputtering coater
Lab thin film Coating Systems, Magnetron Sputter coaterNST-600-3HD three-target magnetron sputtering coater
Three-target magnetron sputtering coater is equipped with three target guns, one supporting RF power supply for sputter coating of non-conductive targets, and two supporting DC power supplies for sputter coating of conductive materials
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Lab Hydraulic Press, Lab Sample Preparation Equipment
NST-60T Laboratory Manual Hydraulic Press with PMMA Cover -NST-60F
Lab Hydraulic Press, Lab Sample Preparation EquipmentNST-60T Laboratory Manual Hydraulic Press with PMMA Cover -NST-60F
The 60T hydraulic press is designed use for Scientific research, teaching, testing, pharmaceutical, catalysis, chemical industry, etc with maximum 60 Ton pressing. It has a PMMA protective cover to make sure user avoid hurting.
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Oxygen Plasma Cleaners
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Atmospheric low temperature plasma cleaner acts on the surface of the solid sample, which not only removes the original contaminants and impurities, but also produces an etching effect, which roughens the surface of the sample and forms many fine pits, increasing the ratio of the sample. Surface, improve the wetting properties of the solid surface.
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NST-Atmospheric plasma surface treatment instrument
Atmospheric plasma surface treatment instrument is a compact Atmospheric Plasma Jet-Flow ( so-called Plasma Beam, Plasma Pen) system for surface Treatment, which consist of RF generator, flexible gas delivery pipe and plasma beam head. The plasma jet flow can activate and clean material surface rapidly at low temperature without vacuum, such as single crystal wafer, optical component, plastics etc.
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Compact UV-Ozone Cleaner is a compact Ultraviolet (UV) Ozone cleaner, which is used for cleaning all types crystal substrates to achieve better thin film quality at low cost. Also, it is an excellent tool to remove and strip photoresist, improve surface wettability, Clean SEM & TEM samples, UV polymer activation, assembly etc.
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