Sputtering coater

Compact DC magnetron sputtering coater is a desktop magnetron plasma sputtering coater with a 2″ target head, height adjustable sample holder. Especially suit for coating conductive gold film for SEM sample. It is a compact plasma sputtering coater designed for metallic coatings, such as gold, platinum, and silver. One 2″ gold (4N) target is included.

Compact powder NST coating system consists of 2″ water cold magnetron sputtering head and vibration stage. The particles will jump on the vibration stage during coating and form a core-shell structure. The coater will be useful for preparing special powder for 3D printing and solid state electrolyte powders.

Dual-target NST magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.

Dual-target NST magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.

NST Customized 5 heads RF plasma magnetron sputtering coater is capable of a five-element combinatorial coating of up to 16 samples with varying compositions, making it especially good for searching high-performance solid state electrolyte materials, magnetic alloys, and multiferroic materials.

• Model Number:NST- Sputtering1
• Net Weight:1000mmx775mmx550mm
• Compliance:CE Certified
• Warranty:One Year limited warranty with lifetime support
• MOQ:1
• Payment:L/C D/A D/P T/T Western Union
• Delivery Time:7 day

RF plasma magnetron sputtering coater is a compact 2″ single head RF Plasma magnetron sputtering system coating non-metallic, mainly oxide thin film. It integrates all components into one-floor stand cabinet, including RF power source, quartz vacuum chamber, vacuum pump, recirculation water chiller and film thickness.

Programmable single chamber magnetron sputtering coater is widely used in semiconductor, LED, photovoltaic and other industries. It is mainly used for the preparation of various metal, semiconductor and dielectric materials thin film, and can meet the needs of scientific research and small batch production.

NST Two in one film coater is a compact coating unit with double step rotary vane vacuum pump, which integrates plasma sputtering and evaporating into one small machine.It is specially designed for preparing SEM and EDAX sample for microstructure and micro-area composition analysis in material analysis at low cost. to coat various materials, including carbon.

NST 3 rotary target plasma sputtering coater is a compact three rotary target plasma sputtering coater with a touch screen digital controller, and a substrate heater capable of heating up to 500 °C. It can coat 1-3 types of metallic materials to sample with the diameter up to 50 mm.Three sputtering targets: gold, silver, copper are included for immediate use.

Single target magnetron sputtering coater is equipped with a magnetron sputtering target with a water-cooled interlayer, a 140mm heatable rotating stage, and a DC power supply. The vacuum chamber adopts the top opening method, which makes it easier to change the target. It is an ideal device for making various metal films.