NST has developed its series of Two Stage Liquid Ring Vacuum Pump based on positive displacement liquid ring principle which has a superior performance by getting higher vacuum and at comparatively low water consumption. it develops an ultimate vacuum of 720 mm hg at the sealing water temperature of 30°c with the capacity range of 30 to 1000 m3/hr., the same can be increased put 735 mm hg. When supplied with 15℃ to 18℃. this design is latest considering the saving of energy.
Featrues
1. Environmental technologies: plasma process is the role of gas – solid coherent reactor consumes no water resources, no need to add chemicals and no environmental pollution.
2. Wide adaptability: regardless of processing substrate type, such as metals, semiconductors.
Dual-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated
The small plasma sputtering and evaporation two-in-one coating machine is equipped with DC sputtering target and thermal evaporation assembly, which can not only be used for metal film plating by plasma sputtering, but also obtain carbon or other metal elemental films by evaporation.
Three target heads plasma sputtering coater is a cost-effective plasma sputter coating equipment independently developed by our company. It has the advantages of compact structure, easy to use, high integration and strong sense of design
Small plasma sputtering coater is a cost-effective plasma sputter coating equipment independently developed by our company. It has the advantages of compact structure, easy to use, high integration and strong sense of design.
Dual-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated
5L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned
10L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned
10L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned
10L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned.
5L plasma cleaner is a compact, non-destructive cleaning device. The plasma cleaner uses low air pressure to excite plasma as a cleaning medium, thereby effectively avoiding secondary pollution caused by the liquid cleaning medium to the object to be cleaned
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The NST board plasma cleaning machine can be processed online at high speed to improve production efficiency. The characteristics of the plasma are used to clean, activate and activate the surface of the solid material to be treated, thereby realizing the purpose of changing the surface microstructure, chemical properties and energy.
Combinatorial plasma sputtering coater has three 2” magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and create various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery).
NST Customized 5 heads RF plasma magnetron sputtering coater is capable of a five-element combinatorial coating of up to 16 samples with varying compositions, making it especially good for searching high-performance solid state electrolyte materials, magnetic alloys, and multiferroic materials.
Penning gauge is a cold cathode Ionisation gauge consisting of two electrodes anode and cathode in side sensor. A potential difference of about 2.2 KV is applied between anode and cathode through current limiting resistors. A magnetic field is introduced at right angles to the plane of the electrodes by a permanent magnet which will increase the ionisation current. The electrons emitted from the cathode (gauge head body) of the gauge head are deflected by means of magnetic field applied at right angles to the plane of the electrodes and are made to take helical path before reaching the anode loop.
NST Dual chamber pulse laser coater consists of vacuum chamber (main sputtering chamber, sample inlet chamber), sample transfer mechanism, sample frame, rotating target table, vacuum exhaust, vacuum measurement, electrical control, gas distribution, computer control and other parts.
NST Electron beam evaporation coating system is mainly composed of evaporation vacuum chamber, e-type electron gun, thermal evaporation electrode, rotary substrate heating platform, working air path, exhaust system, vacuum measurement, electronic control system and installation machine platform.
NST Four sources thermal evaporating system is a compact thermal evaporating system with total 4 evaporating source crucibles and precision and programmable temperature control. Four evaporating crucibles could be used to deposit multiple different materials to grow multilayers films one by one in the same chamber.
NST-EQ-UNIPOL-1210 grinding/polishing machine is equipped with 12″ lapping plate and can be used as a standard manual grinder, or lapping/polishing machine for both of flat sample and metallographic samples. It is the most cost effective solution for the material research lab to prepare metallographic samples and failure analysis.
NST 1700°C 40-Segment Muffle Furnace W/ PC Interface 
Vacuum Molybdenum Furnace 
